Coated article with low-e coating having absorbing layers for low film side reflectance and low visible transmission

ABSTRACT

Absorbing layers of a low-emissivity (low-E) coating are designed to cause the coating to have a reduced film side reflectance which is advantageous for aesthetic purposes. In certain embodiments, the absorbing layers are metallic or substantially metallic (e.g., NiCr or NiCrN x ) and are positioned in order to reduce or prevent oxidation of the absorbing layers during optional heat treatment (e.g., thermal tempering, heat bending, and/or heat strengthening). Coated articles according to certain example embodiments of this invention may be used in the context of insulating glass (IG) window units, other types of windows, etc.

This invention relates to a coated article including a low-emissivity (low-E) coating. In certain example embodiments, absorbing layers of the low-E coating are positioned designed to cause the coating to have both (i) a low visible transmission (e.g., no greater than 45%, more preferably no greater than 40%, and most preferably no greater than 35%), and (ii) a reduced visible film side reflectance. An upper absorbing layer may be provided in an upper stack and another absorbing layer may be provided in a middle stack of the low-E coating. In certain example embodiments, the absorbing layers are metallic or substantially metallic. The absorbing layer in the middle stack may be provided between first and second nitride layers (e.g., silicon nitride based layers), whereas the absorbing layer in the upper stack may be provided between a nitride layer and a metallic or substantially metallic infrared (IR) reflecting layer, in order to reduce or prevent oxidation of the absorbing layers during optional heat treatment (e.g., thermal tempering, heat bending, and/or heat strengthening) and/or manufacturing thereby permitting predictable coloration and optical characteristics to be achieved. Coated articles according to certain example embodiments of this invention may be used in the context of insulating glass (IG) window units, vehicle windows, other types of windows, or in any other suitable application.

BACKGROUND OF THE INVENTION

Coated articles are known in the art for use in window applications such as insulating glass (IG) window units, vehicle windows, and/or the like. It is known that in certain instances, it is desirable to heat treat (e.g., thermally temper, heat bend and/or heat strengthen) such coated articles for purposes of tempering, bending, or the like in certain example instances. Heat treatment of coated articles typically requires use of temperature(s) of at least 580 degrees C., more preferably of at least about 600 degrees C. and still more preferably of at least 620 degrees C. Such high temperatures (e.g., for 5-10 minutes or more) often cause coatings to break down and/or deteriorate or change in an unpredictable manner. Thus, it is desirable for coatings to be able to withstand such heat treatments (e.g., thermal tempering), if desired, in a predictable manner that does not significantly damage the coating.

In certain situations, designers of coated articles strive for a combination of desirable visible transmission, desirable color, low emissivity (or emittance), and low sheet resistance (R_(s)). Low-emissivity (low-E) and low sheet resistance characteristics permit such coated articles to block significant amounts of IR radiation so as to reduce for example undesirable heating of vehicle or building interiors. Often, more IR radiation being blocked (including reflected) is accompanied by less visible transmission.

U.S. Pat. No. 7,597,965 discloses a low-E coating with an NiCr absorber layer in the lower dielectric stack. However, the example coating in the '965 patent is designed for a high visible transmission, and indeed has a visible transmission (T_(vis) or TY) of 59%. Lower visible transmissions are often desirable. For example, it is often desirable for aesthetic and/or optical purposes to provide coated articles (including low-E coatings) having visible transmissions of no greater than 45%, more preferably no greater than 40%, and sometimes no greater than about 35%. However, when visible transmission of a coated article is reduced via a low-E coating design, the film side reflectance of the coating typically increases.

U.S. Pat. No. 7,648,769 discloses a low-E coating with an NiCr absorber layer provided in the middle dielectric stack, but not in the upper and lower dielectric stacks of the coating (e.g., see FIG. 1 of the '769 patent). Example 1 in the '769 patent realizes, measured monolithically, a visible transmission of 54.5% and a film side reflectance of 19.5%, and when measured in an insulating glass (IG) window unit the values change to a visible transmission of 50% and a film side reflectance of 23%. Example 2 in the '769 patent has a higher visible transmission and realizes, measured monolithically, a visible transmission of 67.5% and a film side reflectance of 11.5%, and when measured in an insulating glass (IG) window unit the values change to a visible transmission of 62% and a film side reflectance of 17%. The examples in the '769 patent teach that when visible transmission goes down, film side reflectance goes up.

It will also be explained herein, in the detailed description section, that providing a given absorber layer only in the middle dielectric stack of a low-E coating having a visible transmission of about 40% results in an undesirably high visible film side reflectance (RfY) of over 30% (measured monolithically).

Thus, it will be appreciated that it has been difficult to achieve coated articles, including low-E coatings, having a combination of both (i) desirably low visible transmission, and (ii) low film side reflectance. It will be apparent to those skilled in the art that there exists a need in the art for a coated article having low emissivity (or low sheet resistance) and a combination of both low visible transmission (e.g., no greater than 45%, more preferably no greater than about 40%, and most preferably no greater than about 35%) and low film side reflectance.

BRIEF SUMMARY OF EXAMPLE EMBODIMENTS OF THE INVENTION

A coated article includes a low-E coating. In certain example embodiments, absorbing layers in the low-E coating are positioned/designed to cause the low-E coating to have both (i) a low visible transmission (e.g., no greater than 45%, more preferably no greater than 40%, and most preferably no greater than 35%), and (ii) low visible film side reflectance which is advantageous for aesthetic purposes. An absorbing layer is be provided in an upper stack of the low-E coating and another absorbing layer is provided in a middle stack of the low-E coating, and in certain double-silver embodiments no similar absorbing layer is provided in the lower stack of the low-E coating. The absorbing layers are metallic or substantially metallic NiCr or NiCrN_(x)). In certain example embodiments the absorbing layer in the Middle stack is provided between first and second nitride layers (e.g., silicon nitride based layers), and the absorbing layer in the upper stack is provided between a nitride layer and a metallic or substantially metallic infrared (IR) reflecting layer, in order to reduce or prevent oxidation of the absorbing layers during optional heat treatment (e.g., thermal tempering, heat bending, and/or beat strengthening) and/or manufacturing thereby permitting predictable coloration and optical characteristics to be achieved. It has been found that the use of such absorbing layers in the top and middle portions of the coating surprisingly and unexpectedly allows for a combination of low visible transmission and low film side reflectance to be simultaneously realized. Coated articles according to certain example embodiments of this invention may be used in the context of TG window units, vehicle windows, other types of windows, or in any other suitable application.

In certain example embodiments of this invention, there is provided a coated article including a coating supported by a glass substrate, the coating comprising: first and second infrared (IR) reflecting layers (e.g., of or including silver), wherein said IR reflecting layers are spaced apart from one another, and wherein the first IR reflecting layer is located closer to the glass substrate than is the second IR reflecting layer; a first substantially metallic or metallic absorption layer (e.g., of or including NiCr and/or NiCrN_(x)) located such that the first absorption layer is located between the first and second IR reflecting layers, wherein the first absorption layer is sandwiched between and contacting first and second dielectric layers comprising silicon nitride; and a second substantially metallic or metallic absorption layer (e.g., of or including NiCr and/or NiCrN_(x)) located such that both the first and second FR reflecting layers are located between the glass substrate and the second absorption layer, wherein the second absorption layer is located between and contacting the second IR reflecting layer and a third dielectric layer comprising silicon nitride.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross sectional view of a coated article according to an example embodiment of this invention.

FIG. 2 is a cross sectional view showing the coated article of FIG. 1 provided in an IG window unit according to an example embodiment of this invention.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS OF THE INVENTION

Coated articles herein may be used in applications such as IG window units, vehicle windows, monolithic architectural windows, residential windows, and/or any other suitable application that includes single or multiple glass substrates.

In certain example embodiments of this invention, the coating includes a double-shyer stack (as shown in FIG. 1), although this invention is not so limited in all instances.

For example, in certain example embodiments of this invention, heat treated or non-heat-treated coated articles having multiple IR reflecting layers (e.g., two spaced apart silver based layers) are capable of realizing a sheet resistance (R_(s)) of less than or equal to 3.0 (more preferably less than or equal to 2.5, even more preferably less than or equal to 2.1, and most preferably less than or equal to 2.0). The terms “heat treatment” and “heat treating” as used herein mean heating the article to a temperature sufficient to achieve thermal tempering, heat bending, and/or heat strengthening of the glass inclusive article. This definition includes, for example, heating a coated article in an oven or furnace at a temperature of least about 580 degrees C., more preferably at least about 600 degrees C., for a sufficient period to allow tempering, bending, and/or heat strengthening. In certain instances, the HT may be for at least about 4 or 5 minutes. The coated article may or may not be heat treated in different embodiments of this invention.

FIG. 1 is a side cross sectional view of a coated article according to an example non-limiting embodiment of this invention. The coated article includes substrate 1 (e.g., clear, green, bronze, or blue-green glass substrate from about 1.0 to 10.0 mm thick, more preferably from about 1.0 mm to 3.5 mm thick), and low-E coating (or layer system) 30 provided on the substrate 1 either directly or indirectly. The coating (or layer system) 30 includes, for example: bottom dielectric silicon nitride layer 3 which may be Si₃N₄, of the Si-rich type for haze reduction, or of any other suitable stoichiometry silicon nitride in different embodiments of this invention, first lower contact layer 7 (which contacts bottom IR reflecting layer 9), first conductive and preferably metallic or substantially metallic infrared (IR) reflecting layer 9, first upper contact layer 11 (which contacts layer 9), dielectric layer 13, dielectric silicon nitride based and/or inclusive layer 14, metallic or substantially metallic absorbing layer 4 (e.g., of or including NiCr, NiCrN_(x), or the like), additional dielectric silicon nitride layer 14′ which may be Si₃N₄, of the Si-rich type for haze reduction, or of any other suitable stoichiometry silicon nitride, tin oxide inclusive based and/or inclusive interlayer 15, second lower contact layer 17 (which contacts IR reflecting layer 19), second conductive and preferably metallic or substantially metallic IR reflecting layer 19, metallic or substantially metallic absorbing layer 25 (e.g., of or including NiCr, NiCrN_(x), or the like) which is located over and contacting the upper IR reflecting layer 19, and overcoat dielectric silicon nitride layer 26 which may be Si₃N₄, of the Si-rich type for haze reduction, or of any other suitable stoichiometry silicon nitride. The “contact” layers 7, 11, and 17 each contact at least one IR reflecting layer (e.g., layer based on Ag). The aforesaid sputter-deposited layers 3-26 make up low-E (i.e., low emissivity) coating 30 that is provided on glass or plastic substrate 1.

In monolithic instances, the coated article includes only one glass substrate 1 as illustrated in FIG. 1. However, monolithic coated articles herein may be used in devices such as laminated vehicle windshields, IG window units, and the like. As for IG window units, an IG window unit may include two spaced apart glass substrates. An example IG window unit is illustrated and described, for example, in U.S. Patent Document No. 2004/0005467, the disclosure of which is hereby incorporated herein by reference. FIG. 2 shows an example IG window unit including the coated glass substrate shown in FIG. 1 coupled to another glass substrate 2 via spacer(s), sealant(s) 40 or the like, with a gap 50 being defined therebetween. This gap 50 between the substrates in IG unit embodiments may in certain instances he filled With a gas such as argon (Ar) (in addition to including air). An example IG unit may comprise a pair of spaced apart clear glass substrates each about 3-6 mm thick, one of which is coated with a coating 30 herein in certain example instances, where the gap 50 between the substrates may be from about 5 to 30 mm, more preferably front about 10 to 20 mm, and most preferably about 16 mm. In certain example instances, the coating 30 may be provided on the interior surface of either substrate facing the gap (the coating is shown on the interior major surface of substrate 1 in FIG. 2 facing the gap 50, but instead could be on the interior major surface of substrate 2 facing the gap 50). Either substrate 1 or substrate 2 may be the outermost substrate of the IG window unit at the building exterior (e.g., in FIG. 2 the substrate 1 is the substrate closest to the building exterior).

Absorption layer 4 is, in certain example embodiments of this invention, located between and contacting nitride based dielectric layers 14 and 14′. In certain example embodiments, each of layers 14 and 14′ surrounding the absorption layer 4 is a nitride layer and is substantially or entirely non-oxidized. Absorption layer 25 is, in certain example embodiments of this invention, located between and contacting the metallic or substantially metallic IR reflecting layer 19 and nitride based dielectric layer 26. In certain example embodiments, each of layers 19 and 26 surrounding the absorption layer 25 is substantially or entirely non-oxidized. Optionally, the outermost portion of layer 26 may be oxided if it is the outermost layer of the coating 30 and exposed to atmosphere. The use of nitride layers 14, 14′ and 26, and metallic or substantially metallic layer 19, around the absorber layers 4 and 25 is advantageous in that it helps prevent (or reduce the likelihood of) the absorption layers 4, 25 from being oxidized during heat treatment, thereby better allowing the absorption layers 4, 25 to perform an intended function, in particular absorbing at least some amount (e.g., at least 5%, more preferably at least 10%) of visible light. It will be appreciated that if a layer becomes too oxidized during heat treatment or the like, it no longer can function as an adequate absorption layer.

In certain example embodiments of this invention, absorption layers 4 and 25 may be of or include NiCr (any suitable ratio or Ni:Cr), and may or may not be nitrided (NiCrN_(x)). Absorption layers 4 and 25 are located between and contacting substantially non-oxided layers as shown in FIG. 1. In certain example embodiments, each of the nitride based layers 14, 14′, 26 surrounding the absorption layers 4, 25 is a nitride layer and is substantially or entirely non-oxidized, and IR reflecting layer 19 is also substantially or entirely non-oxidized. In certain example embodiments, absorption layers 4, 25 may comprise from 0-10% oxygen, more preferably from 0-5% oxygen, and most preferably from 0-2% oxygen (atomic %). In certain example embodiments, one or both absorption layers 4, 25 comprise from 0-20% nitrogen, more preferably from 1-15% nitrogen, and most preferably from about 1-12% nitrogen (atomic %). While NiCr is a preferred material for the absorption layers 4 and 25, it is possible that other materials may instead be used. For example, in certain other heat treatable example embodiments of this invention, the absorption layers 4 and/or 25 may be of or include Ni, Cr, NiCrN_(x), CrN, ZrN, or TiN. In non-heat treatable embodiments, any of the aforesaid materials may be used for the absorption/absorbing layers 4 and/or 25, as well as other materials such as Ti, Zr, NiO_(x) or the like.

The absorbing layers 4 and 25 of the low-E coating 30 are designed to cause the coating 30 to have a lower visible transmission, desirable coloration, and low film side reflectance. In certain example embodiments, the metallic or substantially metallic absorbing layer (e.g., NiCr or NiCrN_(x)) 4 may be from about 20-120 angstroms (Å) thick, more preferably from about 35-75 angstroms (Å) thick, and most preferably from about 50-70 angstroms (Å) thick. In certain example embodiments, the upper metallic or substantially metallic absorbing layer (e.g., NiCr or NiCrN_(x)) 25 may be from about 15-70 angstroms (Å) thick. More preferably from about 23-48 angstroms (Å) thick, and most preferably from about 27-43 angstroms (Å) thick. In certain example embodiments, the upper absorbing layer 25 may be thinner than the lower absorbing layer 4. For example, in certain example embodiments, the upper absorbing layer 25 may be at least 10 angstroms (Å) thinner (more preferably at least 20 angstroms thinner) than the lower absorbing layer 4, in order to provide for desirable optical characteristics of the coated article. It has been found that a combination of low visible transmission, reduced visible film side reflectance, and desirable optical characteristics can be achieved by having absorber layers both in the middle dielectric portion of the stack (see absorber layer 4) and by providing another absorber layer 25 in the upper portion of the stack above the top IR reflecting layer 19, as it has been found that moving significant absorption to the top of the stack via layer 25 results in reduced film side reflectance compared to providing absorber layer only between the IR reflecting layers. While still allowing for desirable optical characteristics such as color at angle, etc. via absorption layer 4 in the middle portion of the stack.

Thus, an absorbing layer 25 is provided in the upper stack (above the upper Ag based IR reflecting layer 19), and a second absorbing layer 4 is provided in the middle portion of the stack (between the IR reflecting layers 9, 19). Preferably, in certain double-silver embodiments (i.e., where the low-E coating has two Ag-based IR reflecting layers), no similar absorbing layer is provided below the lower IR reflecting layer 9. In other words, while absorber layers 4 and 25 are provided in middle and upper portions of the coating, there is no similar absorber layer between nitrides provided below the bottom IR reflecting layer 9.

Dielectric layers 3, 14, 14′ and 26 may be of or include silicon nitride in certain embodiments of this invention. Silicon nitride layers 3, 14, 14′ and 26 may, among other things, improve heat-treatability of the coated articles and protect the absorbing layers during optional HT, e.g., such as thermal tempering or the like. One or more of the silicon nitride of layers 3, 14, 14′ and 26 may be of the stoichiometric type (i.e., Si₃N₄), or alternatively of the Si-rich type of silicon nitride in different embodiments of this invention. The presence of free Si in a Si-rich silicon nitride inclusive layer 3 may allow certain atoms such as sodium (Na) which migrate outwardly from the glass 1 during HT to be more efficiently stopped by the Si-rich silicon nitride inclusive layer(s) before they can reach the silver 9 and damage the same. It is believed that the Si-rich Si_(x)N_(y) can reduce the amount of damage done to the silver layer(s) during HT in certain example embodiments of this invention thereby allowing sheet resistance (R_(s)) to decrease or remain about the same in a satisfactory manner. Moreover, it is believed that the Si-rich Si_(x)N_(y) can reduce the amount of damage (e.g., oxidation) done to absorbing layer 4 (and/or 25) during HT in certain example optional embodiments of this invention. In certain example embodiments, when Si-rich silicon nitride is used, the Si-rich silicon nitride layer as deposited may be characterized by Si_(x)N_(y) layer(s), where x/y may be from 0.76 to 1.5, more preferably from 0.8 to 1.4, still more preferably from 0.82 to 1.2. Moreover, in certain example embodiments, before and/or after HT the Si-rich Si_(x)N_(y) layer(s) may have an index of refraction “n” of at least 2.05, more preferably of at least 2.07, and sometimes at least 2.10 (e.g., 632 nm) (note: stoichiometric Si₃N₄ which may also be used has an index “n” of 2.02-2.04). It is noted that n and k tend to drop due to heat treatment. Any and/or all of the silicon nitride layers discussed herein may be doped with other materials such as stainless steel or aluminum in certain example embodiments of this invention. For example, any and/or all silicon nitride layers discussed herein may optionally include from about 0-15% aluminum, more preferably from about 1 to 10% aluminum, in certain example embodiments of this invention. The silicon nitride may be deposited by sputtering a target of Si or SiAl, in an atmosphere having argon and nitrogen gas, in certain embodiments of this invention. Small amounts of oxygen may also be provided in certain instances in the silicon nitride layers.

Infrared (IR) reflecting layers 9 and 19 are preferably substantially or entirely metallic and/or conductive, and may comprise or consist essentially of silver (Ag), gold, or any other suitable IR reflecting material. IR reflecting layers 9 and 19 help allow the coating to have low-E and/or good solar control characteristics. The IR reflecting layers may, however, be slightly oxidized in certain embodiments of this invention.

Contact layer 11 may be of or include nickel (Ni) oxide, chromium/chrome (Cr) oxide, NiCr, or a nickel alloy oxide such as nickel chrome oxide (NiCrO_(x)), or other suitable material(s), in certain example embodiments of this invention. The use of, for example, NiCrO_(x) in layer 11 allows durability to be improved. The NiCrO_(x) of layer 11 may be fully oxidized in certain embodiments of this invention (i.e., fully stoichiometric), or alternatively may only be partially oxidized. In certain instances, the NiCrO_(x) layer 11 may be at least about 50% oxidized. Contact layer 11 (e.g., of or including art oxide of Ni and/or Cr) may or may not be oxidation graded in different embodiments of this invention. Oxidation grading means that the degree of oxidation in the layer changes throughout the thickness of the layer so that for example a contact layer may be graded so as to be less oxidized at the contact interface with the immediately adjacent IR reflecting layer 9 than at a portion of the contact layer(s) further or more/most distant from the immediately adjacent IR reflecting layer. Descriptions of various types of oxidation graded contact layers are set forth in U.S. Pat. No. 6,576,349, the disclosure of which is hereby incorporated herein by reference. Contact layer 11 (e.g., of or including an oxide of Ni and/or Cr) may or may not be continuous in different embodiments of this invention across the entire IR reflecting layer 9. In certain alternative example embodiments of this invention, layer 11 may instead be made as a metallic or substantially metallic absorption layer (e.g., NiCr or NiCrN_(x)) like layer 25.

Dielectric layers 13 and 15 may be of or include tin oxide in certain example embodiments of this invention. However, as with other layers herein, other materials may be used in different instances. Interlayer 15 of or including tin oxide is provided under IR reflecting layer 19 so as to be located between silicon nitride layer 14′ and zinc oxide layer 17. The use of such a tin oxide inclusive interlayer 15 results in numerous improvements compared to a situation where the layer is not provided. For example, it has been found that the use of such a tin oxide inclusive interlayer 15 results in a coated article which is capable of realizing: (a) less visible transmission shift due to heat treatment, (b) higher visible transmission following heat treatment; (c) less shifting of certain color value(s) due to heat treatment, (d) substantially neutral coloration following heat treatment; (e) more stable, or even decreasing, sheet resistance due to heat treatment, (f) lower sheet resistance and thus lower emissivity following heat treatment, (g) improved haze characteristics following heat treatment, and/or (h) improved mechanical durability such as scratch resistance before and/or after heat treatment. Thus, in certain example embodiments of this invention, coated articles may be taken to higher temperatures during heat treatment and/or for longer times without suffering undesirable significant transmission drops and/or increases in sheet resistance. In certain alternative embodiments, it is possible to dope the tin oxide of layer 15 with other materials such as Al, Zn or the like. Alternatively, other metal oxide(s) may be used for layer 15 in certain instances.

Lower contact layers 7 and/or 17 in certain embodiments of this invention are of or include zinc oxide (e.g., ZnO). The zinc oxide of layers 7 and 17 may contain other materials as well such as Al (e.g., to form ZnAlO_(x)). For example, in certain example embodiments of this invention, one or more of zinc oxide layers 7, 17 may be doped with from about 1 to 10% Al, more preferably from about 1 to 5% Al, and most preferably about 1 to 4% Al.

Other layer(s) below or above the illustrated coating may also be provided. Thus, while the layer system or coating is “on” or “supported by” substrate 1 (directly or indirectly), other layer(s) may be provided therebetween. Thus, for example, the coating of FIG. 1 may be considered “on” and “supported by” the substrate 1 even if other layer(s) are provided between layer 3 and substrate 1. Moreover, certain layers of the illustrated coating may be removed in certain embodiments, while others may be added between the various layers or the various layer(s) may be split with other layer(s) added between the split sections in other embodiments of this invention without departing from the overall spirit of certain embodiments of this invention.

While various thicknesses and materials may be used in layers in different embodiments of this invention, example thicknesses and materials for the respective layers on the glass substrate 1 in the FIG. 1 embodiment are as follows, from the glass substrate outwardly (note that the NiCr layers may or may not be partially nitrided):

Example Materials/Thicknesses; FIG. 1 Embodiment Layer Preferred More Glass Range Preferred Example (1-10 mm thick) (Å) (Å) (Å) Si_(x)N_(y) (layer 3) 40-750 Å 250-600 Å  419 Å ZnO_(x) (layer 7) 10-300 Å 60-150 Å  80 Å Ag (layer 9) 50-200 Å 80-130 Å 119 Å NiCrO_(x) (layer 11) 10-100 Å  12-40 Å  25 Å SnO₂ (layer 13) 0-1,000 Å  200-700 Å  545 Å Si_(x)N_(y) (layer 14) 50-450 Å 80-200 Å 120 Å NiCr (layer 4)  35-75 Å  50-70 Å  62 Å Si_(x)N_(y) (layer 14′) 40-450 Å 70-300 Å 151 Å SnO₂ (layer 15) 30-250 Å 50-200 Å  80 Å ZnO_(x) (layer 17) 10-300 Å 40-130 Å  80 Å Ag (layer 19) 50-200 Å 70-180 Å 153 Å NiCr (layer 25)  23-48 Å  27-43 Å  35 Å Si_(x)N_(y) (layer 26) 40-500 Å 70-400 Å 317 Å

It can be seen that the bottom absorber layer 4 is thicker than the upper absorber layer 25. For example, in certain embodiments the bottom absorber layer 4 is at least 10 Å thicker than the upper absorber layer 25, more preferably at least 20 Å thicker, and even more preferably at least 25 Å thicker. Also, it can be seen that for absorber layer 4, the bottom silicon nitride layer 14 is thinner than the lop silicon nitride layer 14′. For example, surrounding absorber layer 4, in certain embodiments the bottom silicon nitride layer 14 is at least 10 Å thinner than the top silicon nitride layer 14′, more preferably at least about 20 | or 25 Å thinner.

In certain example embodiments of this invention, coated articles herein may have the following optical and solar characteristics set forth in Table 2 when measured monolithically. The sheet resistances (R_(s)) herein take into account all IR reflecting layers (e.g., silver layers 9, 19).

Optical/Solar Characteristics (Monolithic; pre-HT) Characteristic General More Preferred Most Preferred R_(s) (ohms/sq.): <=3.5  <=2.5  <=2.2  E_(n): <=0.07 <=0.04 <=0.03 T_(vis) (Ill. C. 2°); 20-45%  20-43%  24-36%  R_(f)Y (Ill. C., 2 deg.): <=29% <=26% <=24% R_(g)Y (Ill. C., 2 deg.): <=25% <=22% <=18%

In certain example embodiments, coated articles herein may have the following characteristics, measured monolithically for example, after heat treatment (HT):

Optical/Solar Characteristics (Monolithic; post-HT) Characteristic General More Preferred Most Preferred R_(s) (ohms/sq.): <=3.0  <=2.1  <=1.9  E_(n): 0.07 <=0.04 <=0.03 T_(vis) (Ill. C. 2°); 20-45%  20-43%  24-36%  R_(f)Y (Ill. C., 2 deg.): <=29% <=26% <=24% R_(g)Y (Ill. C., 2 deg.): <=25% <=22% <=18%

Moreover, in certain example laminated embodiments of this invention, coated articles herein which have been optionally heat treated to an extent sufficient for tempering, and which have been coupled to another glass substrate to form an IG unit, may have the following IG unit optical solar characteristics in a structure as shown in FIG. 2 (e.g., where the two class sheets are 4 mm thick and 6 mm thick respectively of clear glass with a 16 mm gap therebetween filled with 90/10 argon/air). It can be seen that the film side reflection increases when placed in an IC window unit.

Example Optical Features (IG Unit pre or post-HT) Characteristic General More Preferred T_(vis) (or TY)(Ill. C. 2°): 18-45% 20-33% a*_(t) (Ill. C. 2°): −9 to +1.0 −7 to 0.0 b*_(t) (Ill. C. 2°): −10 to +10 −5 to +5 R_(f)Y (Ill. C., 2 deg.): <=31% <= 28% a*_(f) (Ill. C., 2°); −6 to +8 −4 to +4 b*_(f) (Ill. C., 2°): −6 to +12 −2 to +9 R_(g)Y (Ill. C. 2 deg.): 10-30% 15-25% a*_(g) (Ill. C., 2°). −7 to +4 −5 to +1 b*_(g) (Ill. C., 2°): −16 to +5 −14 to 0

The following examples are provided for purposes of example only, and are not intended to be limiting unless specifically claimed.

EXAMPLES

The following Example 1 was made via sputtering on 6 mm thick clear glass substrate so as to have approximately the layer stack set forth below. Example 1 is according to example embodiments of this invention as shown in FIG. 1, whereas the Comparative Example (CE) below has an NiCr absorbing layer only in the middle of the stack and is provided for purposes of comparison. Example 1 had approximately the following layer stack, where the thicknesses are in units of angstroms (Å), and the NiCr absorbing layers 4 and 25 were slightly nitrided.

Example 1

Layer Thickness Glass (6 mm thick) (Å) Si_(x)N_(y) (layer 3) 419 Å ZnO_(x) (layer 7)  80 Å Ag (layer 9) 119 Å NiCrO_(x) (layer 11)  25 Å SnO₂ (layer 13) 545 Å Si_(x)N_(y) (layer 14) 120 Å NiCr (layer 4)  62 Å Si_(x)N_(y) (layer 14′) 151 Å SnO₂ (layer 15)  80 Å ZnO_(x) (layer 17)  80 Å Ag (layer 19) 153 Å NiCr (layer 25)  35 Å Si₃N₄ (layer 26) 317 Å

The Comparative Example (CE) had a NiCr absorbing layer similar to those in Example 1, but in the CE the sole absorbing layer was located only in the middle stack between the silver layers. The CE had the following layer stack from the glass outwardly.

Comparative Example

Layer Thickness Glass (6 min thick) (Å) Si_(x)N_(y) 257 Å ZnO_(x) 100 Å Ag  77 Å NiCrO_(x)  25 Å SnO₂ 530 Å Si_(x)N_(y) 120 Å NiCr 134 Å Si_(x)N_(y) 151 Å SnO₂  80 Å ZnO_(x)  80 Å Ag 197 Å NiCrO_(x)  25 Å SnO₂ 142 Å Si_(x)N_(y) 210 Å

Set forth below are the optical characteristics of Example 1 compared to those of the Comparative Example (CE), measured monolithically post-HT.

Comparison Between Example 1 and Comparative Example

Characteristic Ex. 1 Comparative Example T_(vis) (or TY)(Ill. C. 2°): 32.3% 41.5% a*_(t) (Ill. C. 2°): −5.1 −7.0 b*_(t) (Ill. C. 2°): +0.2 −2.5 R_(f)Y (Ill. C., 2 deg.): 22.3% 32.3% a*_(f) (Ill. C., 2°); −1.7 +6.5 b*_(f) (Ill. C., 2°): +9.8 +11.0 R_(g)Y (Ill. C., 2 deg.): 16.2% 14.5% a*_(g) (Ill. C., 2°). −1.1 −2.1 b*_(g) (Ill. C., 2°): −11.8 −10.2

It can be seen from the above that Example 1 had surprisingly superior (lower) visible film side reflectance (R_(f)Y) than the Comparative Example (CE), even though Example 1 also had lower visible transmission (TY) than the CE, namely 22.3% in Example 1 compared to 32.3% in the CE. Thus, absorbing layers 4 and 25 in the middle and upper portions of the low-E coating in Example 1 (as opposed to only in the center portion as in the CE), coupled with removing the tin oxide layer from the CE's upper dielectric stack, surprisingly caused the low-E coating to have a combination of both (i) a low visible transmission, and (ii) low visible film side reflectance. The layer thicknesses of Example 1 also surprisingly allowed more desirable optical characteristics to be realized, compared to the CE.

In certain example embodiments of this invention, there is provided a coated article including a coating 30 supported by a glass substrate 1, the coating comprising: first and second infrared (IR) reflecting layers 9 and 19 comprising silver, wherein said IR reflecting layers 9 and 19 are spaced apart from one another, and wherein the first IR reflecting layer 9 is located closer to the glass substrate 1 than is the second IR reflecting layer 19; a first substantially metallic or metallic absorption layer 4 comprising Ni and/or Cr located such that the first absorption layer 4 is located between the first and second IR reflecting layers 9 and 19, wherein the first absorption layer 4 is sandwiched between and contacting first and second dielectric layers 14 and 14′ comprising or consisting essentially of silicon nitride; and a second substantially metallic or metallic absorption layer 25 comprising Ni and/or Cr located such that both the first and second IR reflecting layers 9, 19 are located between the glass substrate 1 and the second absorption layer 25, wherein the second absorption layer 25 is located between and contacting the second IR reflecting layer 19 and a third dielectric layer 26 comprising silicon nitride.

In the coated article of the immediately preceding paragraph, said first and/or second absorption layers may each comprise or consist essentially of NiCr and/or NiCrN_(x).

In the coated article of any of the preceding two paragraphs, said first and/or second absorption layers may each comprise from 1-15% nitrogen (atomic %).

In the coated article of any of the preceding three paragraphs, said first and second IR reflecting layers are spaced apart by at least, moving away from the glass substrate: a layer comprising tin oxide 13, said first layer comprising silicon nitride 14, said first absorption layer 4, said second dielectric layer comprising silicon nitride 14′, another layer comprising tin oxide 15, and a layer comprising zinc oxide 17.

In the coated article of any of the preceding four paragraphs, in certain example embodiments no metallic or substantially metallic absorption layer is located between the first IR reflecting layer and the glass substrate.

In the coated article of any of the preceding five paragraphs, in certain example embodiments only two IR reflecting layers comprising silver are contained in the coating.

In the coated article of any of the preceding six paragraphs, the first absorption layer may be from about 35-75 angstroms (Å) thick.

In the coated article of any of the preceding seven paragraphs, the second absorption layer may be from about 23-48 angstroms (Å) thick.

In the coated article of any of the preceding eight paragraphs, the first absorption layer may be substantially thicker than the second absorption layer.

In the coated article of any of the preceding nine paragraphs, said coated article may have a visible transmission of from about 20-43% (more preferably from about 24-36%), measured monolithically.

In the coated article of any of the preceding ten paragraphs, the coated article may be thermally tempered, or not heat treated.

In the coated article of any of the preceding eleven paragraphs, the coating in certain example embodiments may contain no more than two metallic or substantially metallic absorption layers consisting essentially of NiCr or NiCrN_(x).

In the coated article of any of the preceding twelve paragraphs, the third layer comprising silicon nitride may be an uppermost layer of the coating.

In the coated article of any of the preceding thirteen paragraphs, said first IR reflecting layer and said first absorption layer may be spaced apart by at least, moving away from the glass substrate: a layer comprising an oxide of NiCr, a layer comprising tin oxide, and the first layer comprising silicon nitride.

In the coated article of any of the preceding fourteen paragraphs, the coated article may have a visible film side reflectance (RfY), measured monolithically, of less than or equal to 26%, more preferably less than or equal to 24%.

In the coated article of any of the preceding fifteen paragraphs, a substantially oxided layer comprising an oxide of NiCr may be located over and directly contacting the first IR reflecting layer.

While the invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not to be limited to the disclosed embodiment, but on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. 

1-22. (canceled)
 23. A coated article including a coating supported by a glass substrate, the coating comprising: first and second infrared (IR) reflecting layers comprising silver, wherein said IR reflecting layers comprising silver are spaced apart from one another, and wherein the first IR reflecting layer comprising silver is located closer to the glass substrate than is the second IR reflecting layer comprising silver; a first absorption layer comprising titanium nitride located such that the first absorption layer is located between the first and second IR reflecting layers comprising silver, wherein the first absorption layer comprising titanium nitride is sandwiched between and contacting first and second dielectric layers comprising silicon nitride; a second absorption layer comprising titanium nitride located such that both the first and second IR reflecting layers comprising silver are located between the glass substrate and the second absorption layer comprising titanium nitride, wherein the second absorption layer comprising titanium nitride is located between and contacting the second IR reflecting layer comprising silver and a third dielectric layer comprising silicon nitride.
 24. The coated article of claim 23, wherein said first and second absorption layers consist essentially of TiN.
 25. The coated article of claim 23, wherein said first and second IR reflecting layers comprising silver are spaced apart by at least, moving away from the glass substrate: a layer comprising tin oxide, said first layer comprising silicon nitride, said first absorption layer, said second dielectric layer comprising silicon nitride, another layer comprising tin oxide, and a layer comprising zinc oxide.
 26. The coated article of claim 23, wherein no metallic or substantially metallic absorption layer is located between the first IR reflecting layer and the glass substrate.
 27. The coated article of claim 23, wherein only two IR reflecting layers comprising silver are contained in the coating.
 28. The coated article of claim 23, wherein the first absorption layer is from about 35-75 angstroms (Å) thick.
 29. The coated article of claim 29, wherein the second absorption layer is from about 23-48 angstroms (Å) thick.
 30. The coated article of claim 23, wherein the first absorption layer is substantially thicker than the second absorption layer.
 31. The coated article of claim 23, wherein said coated article has a visible transmission of from about 20-43%, measured monolithically.
 32. The coated article of claim 23, wherein said coated article has a visible transmission of from 24-36%, measured monolithically.
 33. The coated article of claim 23, wherein the coated article is thermally tempered.
 34. The coated article of claim 23, wherein the coated article is not heat treated.
 35. The coated article of claim 23, wherein the coating contains no more than two absorption layers comprising titanium nitride.
 36. The coated article of claim 23, wherein the third layer comprising silicon nitride is an uppermost layer of the coating.
 37. The coated article of claim 23, wherein said first IR reflecting layer and said first absorption layer are spaced apart by at least, moving away from the glass substrate: a layer comprising an oxide of NiCr, a layer comprising tin oxide, and the first layer comprising silicon nitride.
 38. The coated article of claim 23, wherein the coated article has a visible film side reflectance (RfY), measured monolithically, of less than or equal to 26%.
 39. The coated article of claim 23, wherein a substantially oxided layer comprising an oxide of NiCr is located over and directly contacting the first IR reflecting layer.
 40. The coated article of claim 23, wherein a metallic or substantially metallic layer comprising NiCr and/or NiCrN_(x) is located over and directly contacting the first IR reflecting layer. 